Independent journal index · Open data
OpenAlex CC0 · DOAJ CC0 · Open data
J journal123
Open access DOAJ No APC Active

Chinese Journal of Applied Chemistry

Chinese Journal of Applied Chemistry · Yingyong Huaxue · 应用化学

ISSN:1000-0518

Science China Press · China · 1983

Submit here ↗ Add to compare
Submission → publication26 weeks
APCNo APC
DOAJ✓
Earliest year1983

Value profile v0.1

Topics

Advancements in Photolithography Techniques7% Liquid Crystal Research Advancements6% Extraction and Separation Processes4% Radioactive element chemistry and processing3% Chemical Synthesis and Reactions3% Surfactants and Colloidal Systems3% Hydrogels: synthesis, properties, applications3% Gold and Silver Nanoparticles Synthesis and Applications3%

Academic impact

Cited at least once
65%
Top 10% share of citations
43%
Median citations
5

Originality (citation structure)

—

Integrity

Retracted: 0

Most cited works

  1. ADVANCES IN INTERPENETRATING POLYMER NETWORKS 1993 · 124 cites
  2. EXTRACTION OF RARE-EARTH IONS(Ⅲ) WITH BIS(2,4,4-TRIMETHYLPENTYL) PHOSPHINIC ACID 1993 · 34 cites
  3. STUDIES OF EXTRACTION MECHANISM OF RARE EARTH COMPOUNDS WITH MONO(2-ETHYL HEXYL)2-ETHYL HEXYL PHOSPHONATE(HEH[EHP])Ⅰ.THE DISTRIBUTION OF RARE EARTH COMPOUNDS IN THE SYSTEM HNO3-H2O-HEH[EHP]AND THE EFFECT OF TEMPERATURES AND SOLVENTS 1985 · 23 cites
  4. New Anthraquinone Derivative Produced by Cultivation of Mangrove Endophytic Fungus Fusarium sp. ZZF60 from the South China Sea 2010 · 17 cites
  5. SYNTHESIS,CHARACTERIZATION AND ANTITUMOR ACTIVITY OF COMPLEXES OF 2-CARBONYLPROPIONYL (PYRIDINE-4-FORMYL) HYDRAZONE WITH RARE EARTHS 1992 · 17 cites

Most recent works

  1. Research Progress of Holographic Polymer/Liquid Crystal Composites 2021 · 3 cites
  2. Advanced Lithography: Directed Self-Assembly 2021 · 3 cites
  3. Photolithography of Colloidal Quantum Dots for Display Applications 2021 · 3 cites
  4. Towards Extreme Ultraviolet Lithography: Progress and Challenges of Photoresists 2021 · 2 cites
  5. Research Progress on High Resolution Extreme Ultraviolet Photoresist 2021 · 2 cites

Based on 100 works from OpenAlex (CC0) · method v0.1

Basic information

Publisher
Science China Press
Country/Region
China
Subject
Chemistry
Open access
✓ (gold)
DOAJ
✓
License
CC BY-NC-ND
Earliest year
1983
DOAJ article records
0
Journal website
http://yyhx.ciac.jl.cn/EN/1000-0518/home.shtml
Verify this journal
Master Journal List ↗ · DOAJ ↗
Submission page
http://yyhx.ciac.jl.cn/EN/column/item75.shtml
Reference data How to read journal metrics →
Articles/yr9,025
h-index11
2-yr mean citedness0.00
Last publication year2021
DOAJ article records0
Open access✓

“2-yr mean citedness” is the OpenAlex field summary_stats.2yr_mean_citedness (CC0): mean citations per paper over a two-year window. It is a raw bibliometric field, not a journal rating, and is not used for default ranking.

Correct a record · Request removal

Subject classification

Materials Science799 Chemistry756 Science: Chemistry1
§

Journals in the same subject

More →
0009-2975

ChemInform

Wiley · Germany

APC
—
Time to publish
—
Articles/yr
794,631
0044-8249

Angewandte Chemie

Wiley · Germany

APC
$5,790
Time to publish
—
Articles/yr
143,134
0003-2700

Analytical Chemistry

American Chemical Society · United States

APC
$4,500
Time to publish
—
Articles/yr
140,548
0040-4039

Tetrahedron Letters

Elsevier BV · United Kingdom

APC
$3,610
Time to publish
—
Articles/yr
105,338